ИССЛЕДОВАНИЕ ПОКРЫТИЙ TiAlSiN ПОЛУЧЕННЫХ МЕТОДОМ РЕАКТИВНОГО МАГНЕТРОННОГО РАСПЫЛЕНИЯ В УСЛОВИЯХ СИЛЬНОТОЧНОГО ИОННОГО АССИСТИРОВАНИЯ

Translated title of the contribution: Investigation of TiAlSiN Coatings Deposited by Reactive Magnetron Sputtering under High-Current Ion Assistance

Research output: Contribution to journalArticle

Abstract

Nanocomposite TiAlSiN coatings were deposited by reactive magnetron sputtering with changing of the ratio of the ion current density j) and the flux of condensing atoms jn in a wide range 5-25. To generate plasma in a working chamber, a broad (80 cm2) beam of low-energy (100 eV) electrons was used. The beam current varied from 5 to 30 A and provided changing ofj in a range of 1.8-9 mA/cm2. The effect of j/j changing on properties of coating was investigated. The increasing of j/j, was shown to be accompanied by non-monotonous variation of hardness and texture of coatings as a result of changing of residual stresses. The value j/j, corresponded to maximum hardness (43 GPa) of coatings was defined. The excess of this value was shown to lead to residual stress relaxation and decreasing of the hardness up to 36 GPa.
Translated title of the contributionInvestigation of TiAlSiN Coatings Deposited by Reactive Magnetron Sputtering under High-Current Ion Assistance
Original languageRussian
Pages (from-to)106-112
Number of pages7
JournalПоверхность. Рентгеновские, синхротронные и нейтронные исследования
Issue number6
DOIs
Publication statusPublished - 2017

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  • 29.00.00 PHYSICS

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