ОСАЖДЕНИЕ ПОКРЫТИЙ НА ОСНОВЕ КАРБОНИТРИДА КРЕМНИЯ В ПЛАЗМЕ СИЛЬНОТОЧНОГО РАЗРЯДА С САМОНАКАЛИВАЕМЫМ ПОЛЫМ КАТОДОМ

Translated title of the contribution: Deposition of silicon carbonitride coatings in the plasma of high-current discharge with self-heated hollow cathode

Андрей Игоревич Меньшаков, Даниил Рафаилович Емлин, Николай Васильевич Гаврилов , Юрий Сергеевич Сурков, Сеиф Османович Чолах

Research output: Contribution to journalArticle

Abstract

The method of low temperature (< 200 °С) deposition of thin films based on SiCN in a large volume (0.3 m3) chamber, by decomposition of silicon-organic precursor in nitrogen plasma generated in discharge with self-heating hollow cathode and distantly (40 cm) placed anode was investigated. The working pressure was 0.06 Pa, the time of operation - 2 hours. The results of study of the influence of discharge current (10-30 А), of the gas mixture flow (hexamethyldisilazane 3-6 sccm/min and nitrogen 30 sccm/min) and of the arrangement of samples in the chamber on deposition rate (till 5 microns per hour), as well as microhardness (3-9 GPa), the internal tensions (1-2 GPa) and the coating density (1.5-3 g/cm3) were reported. The dimensions of sample`s processing zone ( h 300´ d 120- D 180 mm) within which the heterogeneity of coating thickness on specimens did not exceed 20% were determined. The structure of deposited films was analyzed by means of IR-spectroscopy, and the plasma composition - by optical emission spectroscopy. It was demonstrated that the increase of discharge current leads to growth of the rate of coatings deposition and the degree of decomposition of precursor molecules. The maximum microhardness of coatings (9, up to 18 GPa in some points) was achieved at the samples placed in ≈ 12 cm from the atomizer at discharge current 20 A.
Translated title of the contributionDeposition of silicon carbonitride coatings in the plasma of high-current discharge with self-heated hollow cathode
Original languageRussian
Pages (from-to)168-172
Number of pages5
JournalИзвестия высших учебных заведений. Физика
Volume61
Issue number8-2 (728)
Publication statusPublished - 2018

GRNTI

  • 29.00.00 PHYSICS

Level of Research Output

  • VAK List

Fingerprint Dive into the research topics of 'Deposition of silicon carbonitride coatings in the plasma of high-current discharge with self-heated hollow cathode'. Together they form a unique fingerprint.

Cite this