A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self-heated hollow cathode in an Ar+N2 medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 µm and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was ~4 µm/h.
|Translated title of the contribution||DEPOSITION OF TIN-COATINGS BY REACTIVE ANODIC EVAPORATION OF TITANIUM IN A DISCHARGE WITH A SELF-HEATED HOLLOW CATHODE|
|Number of pages||3|
|Journal||Письма в Журнал технической физики|
|Publication status||Published - 2021|
- 29.00.00 PHYSICS
Level of Research Output
- VAK List