Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov, A. S. Kamenetskikh, P. V. Trernikov, D. R. Emlin, A. V. Chukin, Yu S. Surkov

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)
Original languageEnglish
Pages (from-to)117-124
Number of pages8
JournalSurface and Coatings Technology
Volume359
DOIs
Publication statusPublished - 15 Feb 2019

Keywords

  • AlO coating
  • Ion assistance
  • Reactive thermal evaporation
  • α-AlO
  • HOLLOW-CATHODE
  • ALPHA-AL2O3 COATINGS
  • alpha-Al2O3
  • PERFORMANCE
  • LOW-TEMPERATURES
  • VACUUM-ARC
  • PLASMA
  • ALUMINA COATINGS
  • HARDNESS
  • Al2O3 coating
  • MAGNETRON SPUTTER-DEPOSITION
  • MICROSTRUCTURE

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

WoS ResearchAreas Categories

  • Materials Science, Coatings & Films
  • Physics, Applied

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