Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov, A. S. Kamenetskikh, P. V. Trernikov, D. R. Emlin, A. V. Chukin, Yu S. Surkov

Research output: Contribution to journalArticleResearchpeer-review

LanguageEnglish
Pages117-124
Number of pages8
JournalSurface and Coatings Technology
Volume359
DOIs
Publication statusPublished - 15 Feb 2019

Fingerprint

Ionization
Evaporation
arcs
Metals
evaporation
Ions
coatings
ionization
Thin films
Coatings
ion currents
Anodes
anodes
Current density
thin films
metals
Magnetic fields
current density
metal vapors
Solenoids

Keywords

  • AlO coating
  • Ion assistance
  • Reactive thermal evaporation
  • α-AlO
  • HOLLOW-CATHODE
  • ALPHA-AL2O3 COATINGS
  • alpha-Al2O3
  • PERFORMANCE
  • LOW-TEMPERATURES
  • VACUUM-ARC
  • PLASMA
  • ALUMINA COATINGS
  • HARDNESS
  • Al2O3 coating
  • MAGNETRON SPUTTER-DEPOSITION
  • MICROSTRUCTURE

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

WoS ResearchAreas Categories

  • Materials Science, Coatings & Films
  • Physics, Applied

Cite this

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title = "Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization",
keywords = "AlO coating, Ion assistance, Reactive thermal evaporation, α-AlO, HOLLOW-CATHODE, ALPHA-AL2O3 COATINGS, alpha-Al2O3, PERFORMANCE, LOW-TEMPERATURES, VACUUM-ARC, PLASMA, ALUMINA COATINGS, HARDNESS, Al2O3 coating, MAGNETRON SPUTTER-DEPOSITION, MICROSTRUCTURE",
author = "Gavrilov, {N. V.} and Kamenetskikh, {A. S.} and Trernikov, {P. V.} and Emlin, {D. R.} and Chukin, {A. V.} and Surkov, {Yu S.}",
year = "2019",
month = "2",
day = "15",
doi = "10.1016/j.surfcoat.2018.12.065",
language = "English",
volume = "359",
pages = "117--124",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier BV",

}

Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. / Gavrilov, N. V.; Kamenetskikh, A. S.; Trernikov, P. V.; Emlin, D. R.; Chukin, A. V.; Surkov, Yu S.

In: Surface and Coatings Technology, Vol. 359, 15.02.2019, p. 117-124.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

AU - Gavrilov, N. V.

AU - Kamenetskikh, A. S.

AU - Trernikov, P. V.

AU - Emlin, D. R.

AU - Chukin, A. V.

AU - Surkov, Yu S.

PY - 2019/2/15

Y1 - 2019/2/15

KW - AlO coating

KW - Ion assistance

KW - Reactive thermal evaporation

KW - α-AlO

KW - HOLLOW-CATHODE

KW - ALPHA-AL2O3 COATINGS

KW - alpha-Al2O3

KW - PERFORMANCE

KW - LOW-TEMPERATURES

KW - VACUUM-ARC

KW - PLASMA

KW - ALUMINA COATINGS

KW - HARDNESS

KW - Al2O3 coating

KW - MAGNETRON SPUTTER-DEPOSITION

KW - MICROSTRUCTURE

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U2 - 10.1016/j.surfcoat.2018.12.065

DO - 10.1016/j.surfcoat.2018.12.065

M3 - Article

VL - 359

SP - 117

EP - 124

JO - Surface and Coatings Technology

T2 - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -