Modelling the dynamic growth of copper and zinc dendritic deposits under the galvanostatic electrolysis conditions

Research output: Contribution to journalArticleResearchpeer-review

10 Citations (Scopus)
Original languageEnglish
Pages (from-to)9-18
Number of pages10
JournalJournal of Electroanalytical Chemistry
Volume750
DOIs
Publication statusPublished - 1 Aug 2015

Keywords

  • Dendritic deposit
  • Zinc
  • Copper
  • Current efficiency
  • Phenomenological model
  • Empirical equation
  • Shell formation time
  • HYDROGEN CODEPOSITION
  • ELECTRODEPOSITION
  • MECHANISM
  • MORPHOLOGY
  • REGIME
  • METALS

ASJC Scopus subject areas

  • Electrochemistry
  • Chemical Engineering(all)
  • Analytical Chemistry

Cite this

@article{62965d52c45e4da4ae97cf525b8fdc9d,
title = "Modelling the dynamic growth of copper and zinc dendritic deposits under the galvanostatic electrolysis conditions",
keywords = "Dendritic deposit, Zinc, Copper, Current efficiency, Phenomenological model, Empirical equation, Shell formation time, HYDROGEN CODEPOSITION, ELECTRODEPOSITION, MECHANISM, MORPHOLOGY, REGIME, METALS",
author = "Ostanina, {T. N.} and Rudoi, {V. M.} and Patrushev, {A. V.} and Darintseva, {A. B.} and Farlenkov, {A. S.}",
year = "2015",
month = "8",
day = "1",
doi = "10.1016/j.jelechem.2015.04.031",
language = "English",
volume = "750",
pages = "9--18",
journal = "Journal of Electroanalytical Chemistry",
issn = "1572-6657",
publisher = "Elsevier BV",

}

TY - JOUR

T1 - Modelling the dynamic growth of copper and zinc dendritic deposits under the galvanostatic electrolysis conditions

AU - Ostanina, T. N.

AU - Rudoi, V. M.

AU - Patrushev, A. V.

AU - Darintseva, A. B.

AU - Farlenkov, A. S.

PY - 2015/8/1

Y1 - 2015/8/1

KW - Dendritic deposit

KW - Zinc

KW - Copper

KW - Current efficiency

KW - Phenomenological model

KW - Empirical equation

KW - Shell formation time

KW - HYDROGEN CODEPOSITION

KW - ELECTRODEPOSITION

KW - MECHANISM

KW - MORPHOLOGY

KW - REGIME

KW - METALS

UR - http://www.scopus.com/inward/record.url?scp=84929153408&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000357755000002

U2 - 10.1016/j.jelechem.2015.04.031

DO - 10.1016/j.jelechem.2015.04.031

M3 - Article

VL - 750

SP - 9

EP - 18

JO - Journal of Electroanalytical Chemistry

JF - Journal of Electroanalytical Chemistry

SN - 1572-6657

ER -