ИССЛЕДОВАНИЕ ПОКРЫТИЙ TiAlSiN ПОЛУЧЕННЫХ МЕТОДОМ РЕАКТИВНОГО МАГНЕТРОННОГО РАСПЫЛЕНИЯ В УСЛОВИЯХ СИЛЬНОТОЧНОГО ИОННОГО АССИСТИРОВАНИЯ

Resultado de la investigación: Article

Resumen

Nanocomposite TiAlSiN coatings were deposited by reactive magnetron sputtering with changing of the ratio of the ion current density j) and the flux of condensing atoms jn in a wide range 5-25. To generate plasma in a working chamber, a broad (80 cm2) beam of low-energy (100 eV) electrons was used. The beam current varied from 5 to 30 A and provided changing ofj in a range of 1.8-9 mA/cm2. The effect of j/j changing on properties of coating was investigated. The increasing of j/j, was shown to be accompanied by non-monotonous variation of hardness and texture of coatings as a result of changing of residual stresses. The value j/j, corresponded to maximum hardness (43 GPa) of coatings was defined. The excess of this value was shown to lead to residual stress relaxation and decreasing of the hardness up to 36 GPa.
Título traducido de la contribuciónInvestigation of TiAlSiN Coatings Deposited by Reactive Magnetron Sputtering under High-Current Ion Assistance
Idioma originalRussian
Páginas (desde-hasta)106-112
Número de páginas7
PublicaciónПоверхность. Рентгеновские, синхротронные и нейтронные исследования
N.º6
DOI
EstadoPublished - 2017

GRNTI

  • 29.00.00 PHYSICS

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