ПОЛУЧЕНИЕ TIN-ПОКРЫТИЙ РЕАКТИВНЫМ АНОДНЫМ ИСПАРЕНИЕМ ТИТАНА В РАЗРЯДЕ С САМОНАКАЛИВАЕМЫМ ПОЛЫМ КАТОДОМ

Resultado de la investigación: Articlerevisión exhaustiva

Resumen

A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self-heated hollow cathode in an Ar+N2 medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 µm and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was ~4 µm/h.
Título traducido de la contribuciónDEPOSITION OF TIN-COATINGS BY REACTIVE ANODIC EVAPORATION OF TITANIUM IN A DISCHARGE WITH A SELF-HEATED HOLLOW CATHODE
Idioma originalRussian
Páginas (desde-hasta)35-37
Número de páginas3
PublicaciónПисьма в Журнал технической физики
Volumen47
N.º10
DOI
EstadoPublished - 2021

GRNTI

  • 29.00.00 PHYSICS

Level of Research Output

  • VAK List

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