ФОРМИРОВАНИЕ α-AL2O3-ПОКРЫТИЙ РЕАКЦИОННЫМ ИСПАРЕНИЕМ С ИНТЕНСИВНЫМ ИОННЫМ СОПРОВОЖДЕНИЕМ ПРИ 500-550 °С

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Resumen

The results of investigation of synthesis conditions and structure of the α phase in A2O3 coatings deposited by reactive anodic evaporation in an arc discharge at low temperature (500-550 °C) are presented. The current density of ion assistance (up to 20 mA/cm2) and the ions energy (25-150 eV) were varied in the experiments at a constant deposition rate of 3 μm/h. The phase composition of the coating was analyzed by x-ray diffraction and infrared spectroscopy. It was shown that the α phase is formed when the threshold bias voltage of 75-100 V is reached and is stable in a limited range of ion energy, the growth of which leads to a decrease in the size of α phase nanocrystallites and coating amorphization. A feature of the coating structure is the preferential orientation (300), the most probable reason for the dominance of which is the growth of the α phase when the orientation relation (440) γ-Al2O3/(300) α-Al2O3 is satisfied.
Título traducido de la contribuciónDEPOSITION OF THE α-AL2O3 COATINGS BY REACTIVEEVAPORATION WITH INTENSIVE ION ASSISTANCE UNDER 500-550 °C
Idioma originalRussian
Páginas (desde-hasta)144-150
Número de páginas7
PublicaciónИзвестия высших учебных заведений. Физика
Volumen63
N.º10 (754)
DOI
EstadoPublished - 2020

GRNTI

  • 29.00.00 PHYSICS

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