Resumen

In this work, the possibility of using KCl–K2SiF6 system for the silicon electrodeposition has been studied. Using a complex of electrochemical methods of analysis (cyclic chronovoltammetry, square-wave voltammetry, chronoamperometry), the kinetics of electroreduction of silicon ions on glassy carbon in the KCl melt with the addition of 5 wt % K2SiF6 at a temperature of 790°C was studied. It was shown that the silicon electroreduction is a reversible process which proceeds in a single 4-electron stage under the experimental conditions. Formal kinetic parameters of silicon electroreduction under conditions of nonstationary polarization were determined. According to the Berzins–Delahey equation for an electrochemically reversible process, the diffusion coefficient of electroactive ions was estimated, which was 1.87 · 10–6 cm2/s. On the basis of electrochemical measurements, the parameters of silicon electrodeposition from the melts under stude were selected. The silicon electrodeposition on a glassy carbon substrate was carried out in a potentiostatic mode at a potential from –0.1 to –0.25 V relative to the silicon quasireference electrode. As a result, silicon deposits of a fiber structure with an average particle size of 200–300 nm were obtained.
Título traducido de la contribuciónSILICON ELECTROREDUCTION FROM THE KCL–K2SIF6 MELT
Idioma originalRussian
Páginas (desde-hasta)187-198
Número de páginas12
PublicaciónРасплавы
N.º2
DOI
EstadoPublished - 2021

Level of Research Output

  • VAK List

Huella Profundice en los temas de investigación de 'ЭЛЕКТРОВЫДЕЛЕНИЕ КРЕМНИЯ ИЗ РАСПЛАВА KCL–K<sub>2</sub>SIF<sub>6</sub>'. En conjunto forman una huella única.

Citar esto