Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov; A. S. Kamenetskikh; P. V. Trernikov; D. R. Emlin; A. V. Chukin; Yu S. Surkov

doi:10.1016/j.surfcoat.2018.12.065

Al₂O₃ thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov, A. S. Kamenetskikh, P. V. Trernikov, D. R. Emlin, A. V. Chukin, Yu S. Surkov

Resultado de pesquisa: Article › revisão de pares

Idioma original	English
Páginas (de-até)	117-124
Número de páginas	8
Revista	Surface and Coatings Technology
Volume	359
DOIs	https://doi.org/10.1016/j.surfcoat.2018.12.065
Estado da publicação	Published - 15 fev. 2019

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

WoS ResearchAreas Categories

Materials Science, Coatings & Films
Physics, Applied

Acesso ao documento

10.1016/j.surfcoat.2018.12.065

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Зацепин, А. Ф., Бухвалов, Д. В., Вонг, Ч. Х., Арбузов, В. Я., Кузнецова, Ю. А., Бунтов, Е. А., Зацепин, Д. А., Емлин, Д. Р., Щапова, Ю. В., Лэй, С., Бокизода, Д. А. & Оксенгендлер, Б. Л.
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Citar isto

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title = "Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization",

keywords = "AlO coating, Ion assistance, Reactive thermal evaporation, α-AlO, HOLLOW-CATHODE, ALPHA-AL2O3 COATINGS, alpha-Al2O3, PERFORMANCE, LOW-TEMPERATURES, VACUUM-ARC, PLASMA, ALUMINA COATINGS, HARDNESS, Al2O3 coating, MAGNETRON SPUTTER-DEPOSITION, MICROSTRUCTURE",

author = "Gavrilov, {N. V.} and Kamenetskikh, {A. S.} and Trernikov, {P. V.} and Emlin, {D. R.} and Chukin, {A. V.} and Surkov, {Yu S.}",

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day = "15",

doi = "10.1016/j.surfcoat.2018.12.065",

language = "English",

volume = "359",

pages = "117--124",

journal = "Surface and Coatings Technology",

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AU - Gavrilov, N. V.

AU - Kamenetskikh, A. S.

AU - Trernikov, P. V.

AU - Emlin, D. R.

AU - Chukin, A. V.

AU - Surkov, Yu S.

PY - 2019/2/15

Y1 - 2019/2/15

KW - AlO coating

KW - Ion assistance

KW - Reactive thermal evaporation

KW - α-AlO

KW - HOLLOW-CATHODE

KW - ALPHA-AL2O3 COATINGS

KW - alpha-Al2O3

KW - PERFORMANCE

KW - LOW-TEMPERATURES

KW - VACUUM-ARC

KW - PLASMA

KW - ALUMINA COATINGS

KW - HARDNESS

KW - Al2O3 coating

KW - MAGNETRON SPUTTER-DEPOSITION

KW - MICROSTRUCTURE

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U2 - 10.1016/j.surfcoat.2018.12.065

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M3 - Article

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VL - 359

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EP - 124

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -