SCALING OF DLC CHEMICAL VAPOR DEPOSITION METHOD WITH THE USE OF THE PLASMA CATHODE

D. R. Emlin, S. A. Plotnikov, N. V. Gavrilov, I. Sh. Trachtrnberg, I. G. Khatmullin

Resultado de pesquisa: Articlerevisão de pares

Resumo

Parameters of plasma generated in a large volume (0.34 m 3) chamber by pulsed injection of electrons (50 kHz, 10 ms) with 50-400 eV energy from the plasma generated by dc glow discharge in electrode system of the plasma cathode with grid stabilization (GPC) were investigated. Two GPC with a total electron emission current of 6 A were used in the study. The maximum current of a pulsed non-self-sustained discharge was limited by 15 A and the density of an ion current did not exceed 1 mA/cm 2 that provides high rate of diamond-like coatings (DLC) deposition at the temperatures excluding their overheating and graphitizing. Space non-uniformity of argon plasma density did not exceed 20 % in the area of ~ 400x400 mm 2 size. Results of tests of industrial-scale vacuum coater UVNIPA 1-002 completed with two GPCs are given. Voltage-current characteristics of the discharge in Ar + C 2H 2 gas mixture and dynamics of gas pressure in the processing chamber were investigated during the DLC deposition process. Optimum ratio of the discharge current and Ar + С 2Н 2 gas flow which ensures high microhardness of DLC (~ 20-35 GPa) and high rate of DLC deposition (~ 1 |im/h) was determined. Up to 10 at. % Ar and O are contained in DLC.
Idioma originalEnglish
Páginas (de-até)66-70
RevistaИзвестия высших учебных заведений. Физика
Volume55
Número de emissão12-2
Estado da publicaçãoPublished - 2012

GRNTI

  • 29.00.00 PHYSICS

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  • VAK List

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