Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov, A. S. Kamenetskikh, P. V. Trernikov, D. R. Emlin, A. V. Chukin, Yu S. Surkov

Результат исследований: Вклад в журналСтатьяНаучно-исследовательскаярецензирование

2 Цитирования (Scopus)
Язык оригиналаАнглийский
Страницы (с-по)117-124
Число страниц8
ЖурналSurface and Coatings Technology
Том359
DOI
СостояниеОпубликовано - 15 фев 2019

Отпечаток

Ionization
Evaporation
arcs
Metals
evaporation
Ions
coatings
ionization
Thin films
Coatings
ion currents
Anodes
anodes
Current density
thin films
metals
Magnetic fields
current density
metal vapors
Solenoids

Ключевые слова

    Предметные области ASJC Scopus

    • Chemistry(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

    Предметные области WoS

    • Материаловедение, Покрытия и пленки
    • Физика, Прикладная

    Цитировать

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    title = "Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization",
    keywords = "AlO coating, Ion assistance, Reactive thermal evaporation, α-AlO, HOLLOW-CATHODE, ALPHA-AL2O3 COATINGS, alpha-Al2O3, PERFORMANCE, LOW-TEMPERATURES, VACUUM-ARC, PLASMA, ALUMINA COATINGS, HARDNESS, Al2O3 coating, MAGNETRON SPUTTER-DEPOSITION, MICROSTRUCTURE",
    author = "Gavrilov, {N. V.} and Kamenetskikh, {A. S.} and Trernikov, {P. V.} and Emlin, {D. R.} and Chukin, {A. V.} and Surkov, {Yu S.}",
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    journal = "Surface and Coatings Technology",
    issn = "0257-8972",
    publisher = "Elsevier BV",

    }

    Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. / Gavrilov, N. V.; Kamenetskikh, A. S.; Trernikov, P. V.; Emlin, D. R.; Chukin, A. V.; Surkov, Yu S.

    В: Surface and Coatings Technology, Том 359, 15.02.2019, стр. 117-124.

    Результат исследований: Вклад в журналСтатьяНаучно-исследовательскаярецензирование

    TY - JOUR

    T1 - Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

    AU - Gavrilov, N. V.

    AU - Kamenetskikh, A. S.

    AU - Trernikov, P. V.

    AU - Emlin, D. R.

    AU - Chukin, A. V.

    AU - Surkov, Yu S.

    PY - 2019/2/15

    Y1 - 2019/2/15

    KW - AlO coating

    KW - Ion assistance

    KW - Reactive thermal evaporation

    KW - α-AlO

    KW - HOLLOW-CATHODE

    KW - ALPHA-AL2O3 COATINGS

    KW - alpha-Al2O3

    KW - PERFORMANCE

    KW - LOW-TEMPERATURES

    KW - VACUUM-ARC

    KW - PLASMA

    KW - ALUMINA COATINGS

    KW - HARDNESS

    KW - Al2O3 coating

    KW - MAGNETRON SPUTTER-DEPOSITION

    KW - MICROSTRUCTURE

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    U2 - 10.1016/j.surfcoat.2018.12.065

    DO - 10.1016/j.surfcoat.2018.12.065

    M3 - Article

    VL - 359

    SP - 117

    EP - 124

    JO - Surface and Coatings Technology

    JF - Surface and Coatings Technology

    SN - 0257-8972

    ER -