Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films

Damir R. Islamov, Vladimir A. Gritsenko, Timofey V. Perevalov, Vladimir A. Pustovarov, Oleg M. Orlov, Anna G. Chernikova, Andrey M. Markeev, Stefan Slesazeck, Uwe Schroeder, Thomas Mikolajick, Gennadiy Ya Krasnikov

Результат исследований: Вклад в журнал › Статья › Научно-исследовательская › рецензирование

1 цитирование (Scopus)
Язык оригиналаАнглийский
Страницы (с-по)47-55
Число страниц9
ЖурналActa Materialia
Том166
DOI
СостояниеОпубликовано - 1 мар 2019

Отпечаток

Ferroelectric thin films
Ferroelectric materials
Hafnium oxides
Oxygen vacancies
Defects
Data storage equipment
Ferroelectricity
Degradation
Leakage currents
Phase transitions
Experiments

Ключевые слова

    Предметные области ASJC Scopus

    • Electronic, Optical and Magnetic Materials
    • Ceramics and Composites
    • Polymers and Plastics
    • Metals and Alloys

    Предметные области WoS

    • Материаловедение, Междисциплинарные труды
    • Металловедение и Металлургия

    Цитировать

    Islamov, D. R., Gritsenko, V. A., Perevalov, T. V., Pustovarov, V. A., Orlov, O. M., Chernikova, A. G., ... Krasnikov, G. Y. (2019). Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films. Acta Materialia, 166, 47-55. https://doi.org/10.1016/j.actamat.2018.12.008
    Islamov, Damir R. ; Gritsenko, Vladimir A. ; Perevalov, Timofey V. ; Pustovarov, Vladimir A. ; Orlov, Oleg M. ; Chernikova, Anna G. ; Markeev, Andrey M. ; Slesazeck, Stefan ; Schroeder, Uwe ; Mikolajick, Thomas ; Krasnikov, Gennadiy Ya. / Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films. В: Acta Materialia. 2019 ; Том 166. стр. 47-55.
    @article{2b39133448ff4d9b9a3d1096fd0656ed,
    title = "Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films",
    keywords = "Defects, Ferroelectric HfZrO, Leakage currents, Luminescence, Oxygen vacancies, POLARIZATION REVERSAL, MECHANISM, Ferroelectric Hf0.5Zr0.5O2, CHARGE-TRANSPORT, HAFNIUM",
    author = "Islamov, {Damir R.} and Gritsenko, {Vladimir A.} and Perevalov, {Timofey V.} and Pustovarov, {Vladimir A.} and Orlov, {Oleg M.} and Chernikova, {Anna G.} and Markeev, {Andrey M.} and Stefan Slesazeck and Uwe Schroeder and Thomas Mikolajick and Krasnikov, {Gennadiy Ya}",
    year = "2019",
    month = "3",
    day = "1",
    doi = "10.1016/j.actamat.2018.12.008",
    language = "English",
    volume = "166",
    pages = "47--55",
    journal = "Acta Materialia",
    issn = "1359-6454",
    publisher = "Elsevier BV",

    }

    Islamov, DR, Gritsenko, VA, Perevalov, TV, Pustovarov, VA, Orlov, OM, Chernikova, AG, Markeev, AM, Slesazeck, S, Schroeder, U, Mikolajick, T & Krasnikov, GY 2019, 'Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films' Acta Materialia, том. 166, стр. 47-55. https://doi.org/10.1016/j.actamat.2018.12.008

    Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films. / Islamov, Damir R.; Gritsenko, Vladimir A.; Perevalov, Timofey V.; Pustovarov, Vladimir A.; Orlov, Oleg M.; Chernikova, Anna G.; Markeev, Andrey M.; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas; Krasnikov, Gennadiy Ya.

    В: Acta Materialia, Том 166, 01.03.2019, стр. 47-55.

    Результат исследований: Вклад в журнал › Статья › Научно-исследовательская › рецензирование

    TY - JOUR

    T1 - Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films

    AU - Islamov, Damir R.

    AU - Gritsenko, Vladimir A.

    AU - Perevalov, Timofey V.

    AU - Pustovarov, Vladimir A.

    AU - Orlov, Oleg M.

    AU - Chernikova, Anna G.

    AU - Markeev, Andrey M.

    AU - Slesazeck, Stefan

    AU - Schroeder, Uwe

    AU - Mikolajick, Thomas

    AU - Krasnikov, Gennadiy Ya

    PY - 2019/3/1

    Y1 - 2019/3/1

    KW - Defects

    KW - Ferroelectric HfZrO

    KW - Leakage currents

    KW - Luminescence

    KW - Oxygen vacancies

    KW - POLARIZATION REVERSAL

    KW - MECHANISM

    KW - Ferroelectric Hf0.5Zr0.5O2

    KW - CHARGE-TRANSPORT

    KW - HAFNIUM

    UR - http://www.scopus.com/inward/record.url?scp=85058713122&partnerID=8YFLogxK

    UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000459358200005

    U2 - 10.1016/j.actamat.2018.12.008

    DO - 10.1016/j.actamat.2018.12.008

    M3 - Article

    VL - 166

    SP - 47

    EP - 55

    JO - Acta Materialia

    JF - Acta Materialia

    SN - 1359-6454

    ER -

    Islamov DR, Gritsenko VA, Perevalov TV, Pustovarov VA, Orlov OM, Chernikova AG и соавт. Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films. Acta Materialia. 2019 Март 1;166:47-55. https://doi.org/10.1016/j.actamat.2018.12.008

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