Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy

V. V. Privezentsev, V. S. Kulikauskas, V. V. Zatekin, D. V. Petrov, A. V. Makunin, A. A. Shemukhin, A. V. Lutzau, A. V. Putrik

Результат исследований: Вклад в журналСтатьяНаучно-исследовательскаярецензирование

1 цитирование (Scopus)
Язык оригиналаАнглийский
Страницы (с-по)794-800
Число страниц7
ЖурналJournal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Том8
Номер выпуска4
DOI
СостояниеОпубликовано - 2014

Отпечаток

Rutherford backscattering spectroscopy
Silicon
Zinc
Doping (additives)
Ions
Oxygen
Zinc Oxide
Electron emission
Zinc oxide
Surface morphology
Atomic force microscopy
Impurities
Nanoparticles
X rays
Scanning electron microscopy

Предметные области ASJC Scopus

  • Surfaces, Coatings and Films

Предметные области WoS

  • Физика, Конденсированных сред

Цитировать

Privezentsev, V. V., Kulikauskas, V. S., Zatekin, V. V., Petrov, D. V., Makunin, A. V., Shemukhin, A. A., ... Putrik, A. V. (2014). Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy. Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, 8(4), 794-800. https://doi.org/10.1134/S1027451014040302
Privezentsev, V. V. ; Kulikauskas, V. S. ; Zatekin, V. V. ; Petrov, D. V. ; Makunin, A. V. ; Shemukhin, A. A. ; Lutzau, A. V. ; Putrik, A. V. / Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy. В: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 2014 ; Том 8, № 4. стр. 794-800.
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Privezentsev, VV, Kulikauskas, VS, Zatekin, VV, Petrov, DV, Makunin, AV, Shemukhin, AA, Lutzau, AV & Putrik, AV 2014, 'Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy' Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, том. 8, № 4, стр. 794-800. https://doi.org/10.1134/S1027451014040302

Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy. / Privezentsev, V. V.; Kulikauskas, V. S.; Zatekin, V. V.; Petrov, D. V.; Makunin, A. V.; Shemukhin, A. A.; Lutzau, A. V.; Putrik, A. V.

В: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, Том 8, № 4, 2014, стр. 794-800.

Результат исследований: Вклад в журналСтатьяНаучно-исследовательскаярецензирование

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T1 - Study of silicon implanted with zinc and oxygen ions via Rutherford backscattering spectroscopy

AU - Privezentsev, V. V.

AU - Kulikauskas, V. S.

AU - Zatekin, V. V.

AU - Petrov, D. V.

AU - Makunin, A. V.

AU - Shemukhin, A. A.

AU - Lutzau, A. V.

AU - Putrik, A. V.

PY - 2014

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DO - 10.1134/S1027451014040302

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VL - 8

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EP - 800

JO - Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques

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