ПОЛУЧЕНИЕ TIN-ПОКРЫТИЙ РЕАКТИВНЫМ АНОДНЫМ ИСПАРЕНИЕМ ТИТАНА В РАЗРЯДЕ С САМОНАКАЛИВАЕМЫМ ПОЛЫМ КАТОДОМ

科研成果: Article同行评审

摘要

A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self-heated hollow cathode in an Ar+N2 medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 µm and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was ~4 µm/h.
投稿的翻译标题DEPOSITION OF TIN-COATINGS BY REACTIVE ANODIC EVAPORATION OF TITANIUM IN A DISCHARGE WITH A SELF-HEATED HOLLOW CATHODE
源语言Russian
页(从-至)35-37
页数3
期刊Письма в Журнал технической физики
47
10
DOI
Published - 2021

GRNTI

  • 29.00.00 PHYSICS

Level of Research Output

  • VAK List

指纹

探究 'ПОЛУЧЕНИЕ TIN-ПОКРЫТИЙ РЕАКТИВНЫМ АНОДНЫМ ИСПАРЕНИЕМ ТИТАНА В РАЗРЯДЕ С САМОНАКАЛИВАЕМЫМ ПОЛЫМ КАТОДОМ' 的科研主题。它们共同构成独一无二的指纹。

引用此