Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

N. V. Gavrilov, A. S. Kamenetskikh, P. V. Trernikov, D. R. Emlin, A. V. Chukin, Yu S. Surkov

科研成果: Article同行评审

6 引用 (Scopus)
源语言English
页(从-至)117-124
页数8
期刊Surface and Coatings Technology
359
DOI
Published - 15 二月 2019

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

WoS ResearchAreas Categories

  • Materials Science, Coatings & Films
  • Physics, Applied

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